发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10970733申请日： 2004-10-22
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公开(公告)号： US07041989B1公开(公告)日： 2006-05-09
- 发明人: Hendrik Antony Johannes Neerhof , Johannes Hubertus Josephina Moors , Joost Jeroen Ottens , Marco Le Kluse
- 申请人： Hendrik Antony Johannes Neerhof , Johannes Hubertus Josephina Moors , Joost Jeroen Ottens , Marco Le Kluse
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/04 ; G03B27/62 ; H01L21/66
摘要：
A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.
公开/授权文献
- US20060097201A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2006-05-11
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