公开(公告)号：US20110126406A1

公开(公告)日：2011-06-02

申请号：US13020399

申请日：2011-02-03

申请人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

发明人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

IPC分类号： H01B13/00

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US08476167B2

公开(公告)日：2013-07-02

申请号：US13020399

申请日：2011-02-03

申请人： Hubert Adriaan Van Mierlo ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

发明人： Hubert Adriaan Van Mierlo ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

IPC分类号： H01L21/311

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US07245357B2

公开(公告)日：2007-07-17

申请号：US10734642

申请日：2003-12-15

申请人： Erwin Van Zwet ,  Jan Van Elp ,  Johannes Hubertus Josephina Moors ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Adrianus Mathijs Maria De Groof ,  Leo Wilhelmus Maria Kuipers ,  Peter Theodorus Maria Giesen ,  Marco Le Kluse

发明人： Erwin Van Zwet ,  Jan Van Elp ,  Johannes Hubertus Josephina Moors ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Adrianus Mathijs Maria De Groof ,  Leo Wilhelmus Maria Kuipers ,  Peter Theodorus Maria Giesen ,  Marco Le Kluse

IPC分类号： G03B27/58 ,  G03B27/62 ,  H01T23/00

CPC分类号： H01L21/67259 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/7075

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

摘要翻译： 公开了一种光刻设备。 光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。 物品处理器包括电极和电介质层，以形成用于静电夹紧物品的静电夹。

公开(公告)号：US07041989B1

公开(公告)日：2006-05-09

申请号：US10970733

申请日：2004-10-22

申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Le Kluse

发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Le Kluse

IPC分类号： G03B27/58 ,  G03B27/04 ,  G03B27/62 ,  H01L21/66

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

公开(公告)号：US20060097201A1

公开(公告)日：2006-05-11

申请号：US10970733

申请日：2004-10-22

申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

IPC分类号： G01J3/10

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

公开(公告)号：US07187433B2

公开(公告)日：2007-03-06

申请号：US11099650

申请日：2005-04-06

申请人： Joost Jeroen Ottens ,  Hendrik Antony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

发明人： Joost Jeroen Ottens ,  Hendrik Antony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

IPC分类号： G03B27/58 ,  G03B27/62 ,  G03B27/42

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70708

摘要： An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp and a backfill gas pressure to release the article from the article support structure by use of the backfill gas pressure.

摘要翻译： 提供了一种用于光刻设备的静电夹持组件。 夹具组件包括静电夹具，其被构造成在辐射束投影期间将制品夹紧在物品支撑结构上;以及控制器，其被构造成控制夹具和回填气体压力中的至少一个以将物品从物品支撑件 结构通过使用回填气压力。

公开(公告)号：US07088431B2

公开(公告)日：2006-08-08

申请号：US10736778

申请日：2003-12-17

申请人： Joost Jeroen Ottens ,  Johannes Hubertus Josephina Moors ,  Peter Theodorus Maria Giesen

发明人： Joost Jeroen Ottens ,  Johannes Hubertus Josephina Moors ,  Peter Theodorus Maria Giesen

IPC分类号： G03B27/62 ,  G03B27/58 ,  H02N13/00

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70875

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，用于将物品夹紧在物品支撑件上的静电夹具 通过在投影期间的静电场，以及设置在物品支撑件中的凹进的回填气体进料，用于当由物品支撑件支撑时将回填气体供给到物品的背面。 根据本发明的一个方面，凹入的回填气体进料包括用于屏蔽来自静电场的凹进的回填气体进料中的回填气体的屏蔽层。

公开(公告)号：US07528935B2

公开(公告)日：2009-05-05

申请号：US11312654

申请日：2005-12-21

申请人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Johannes Maria Meijer ,  Joost Jeroen Ottens ,  Marco Le Kluse ,  Jan Hopman

发明人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Johannes Maria Meijer ,  Joost Jeroen Ottens ,  Marco Le Kluse ,  Jan Hopman

IPC分类号： G03B27/58 ,  G03B27/62 ,  H01T23/00

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。

公开(公告)号：US06897945B1

公开(公告)日：2005-05-24

申请号：US10734641

申请日：2003-12-15

申请人： Joost Jeroen Ottens ,  Hendrik Anthony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

发明人： Joost Jeroen Ottens ,  Hendrik Anthony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58 ,  G03B27/32 ,  G03B27/42 ,  G03B27/62

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70708

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，布置在物品支撑件中用于进给的回填气体供给 当由物品支撑件支撑时，将气体回填到物品的背面，以及用于在投影期间将物品夹紧在物品支撑件上的夹具。 根据本发明的一个方面，该装置包括用于控制夹紧和/或回填气体进料压力的控制器，以便在减少回填气体进料压力之前释放夹具。

公开(公告)号：US10551752B2

公开(公告)日：2020-02-04

申请号：US13046283

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03F7/20

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.