发明授权
- 专利标题: Plasma reactor and purification equipment
- 专利标题(中): 等离子体反应器和净化设备
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申请号: US10774690申请日: 2004-02-10
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公开(公告)号: US07042159B2公开(公告)日: 2006-05-09
- 发明人: Toshio Tanaka , Kanji Motegi , Kenkichi Kagawa , Toshikazu Ohkubo
- 申请人: Toshio Tanaka , Kanji Motegi , Kenkichi Kagawa , Toshikazu Ohkubo
- 申请人地址: JP Osaka
- 专利权人: Daikin Industries, Ltd.
- 当前专利权人: Daikin Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Shinjyu Global IP Counselors
- 主分类号: H01J7/24
- IPC分类号: H01J7/24 ; H05B31/26
摘要:
In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma reactor and increasing the cost. In the plasma reactor of the invention, a needle-shaped first electrode and a plate-shaped second electrode are disposed to oppose and to be perpendicular to each other, and the first electrode has a pointed portion as the end thereof on the side of the second electrode and the pointed portion has a point angle θ not less than 30 degrees and not more than 90 degrees, and preferably not less than 60 degrees and not more than 90 degrees.
公开/授权文献
- US20050174062A1 Plasma reactor and purification equipment 公开/授权日:2005-08-11