发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10773461申请日： 2004-02-09
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公开(公告)号： US07050146B2公开(公告)日： 2006-05-23
- 发明人: Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- 申请人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
公开/授权文献
- US20050174549A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-08-11
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