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公开(公告)号:US07050146B2
公开(公告)日:2006-05-23
申请号:US10773461
申请日:2004-02-09
申请人: Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人: Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
IPC分类号: G03B27/52
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译: 浸没式光刻设备包括电压发生器或电源,该电压发生器或电源对与浸入液体接触的物体施加电位差,使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体,这是由于电动势 浸泡液中的气泡表面。
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公开(公告)号:USRE42849E1
公开(公告)日:2011-10-18
申请号:US12153717
申请日:2008-05-22
申请人: Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人: Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译: 浸没式光刻设备包括电压发生器或电源,该电压发生器或电源对与浸入液体接触的物体施加电位差,使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体,这是由于电动势 浸泡液中的气泡表面。
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公开(公告)号:US09057967B2
公开(公告)日:2015-06-16
申请号:US12512754
申请日:2009-07-30
申请人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
发明人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
摘要翻译: 光刻投影装置包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统,被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台,所述基板台包括支撑表面,所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板,并且不与所述至少一个 的基材和物体; 以及液体供应系统,其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。
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公开(公告)号:US08241550B2
公开(公告)日:2012-08-14
申请号:US12574211
申请日:2009-10-06
IPC分类号: B29C59/00
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译: 公开了一种压印光刻设备,其具有被配置为保持压印模板,衬底台和光学编码器的模板保持器,所述光学编码器具有辐射输出,第一衍射光栅和检测器,所述辐射输出被布置成照亮 第二衍射光栅和检测器,定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
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公开(公告)号:US20120013867A1
公开(公告)日:2012-01-19
申请号:US13240711
申请日:2011-09-22
申请人: Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christian Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
发明人: Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christian Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译: 公开了一种浸没式光刻设备的衬底台,其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式,可以收集从液体供应系统溢出的任何液体,以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号:US20110279800A1
公开(公告)日:2011-11-17
申请号:US13194136
申请日:2011-07-29
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/42
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号:US20110157570A1
公开(公告)日:2011-06-30
申请号:US12850487
申请日:2010-08-04
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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公开(公告)号:US07868998B2
公开(公告)日:2011-01-11
申请号:US12216126
申请日:2008-06-30
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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公开(公告)号:US07708924B2
公开(公告)日:2010-05-04
申请号:US11185971
申请日:2005-07-21
IPC分类号: B28B11/08
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译: 公开了一种光刻设备,其具有被配置为保持压印模板的模板保持器,布置成接收衬底的衬底台,布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号:US07411653B2
公开(公告)日:2008-08-12
申请号:US10966110
申请日:2004-10-18
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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