发明授权
- 专利标题： Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article
- 专利标题（中）： 使用具有相互不同的频率的高频功率来产生处理物品的等离子体的真空处理装置
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申请号： US10875404申请日： 2004-06-25
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公开(公告)号： US07051671B2公开(公告)日： 2006-05-30
- 发明人: Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
- 申请人： Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2000/377338 20001212; JP2001/017011 20010125; JP2001/210932 20010711; JP2001/360908 20011127
- 主分类号： C23C16/00
- IPC分类号： C23C16/00
摘要：
A vacuum processing method including placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode. The frequencies and power values of the at least two high-frequency powers supplied satisfy a required relationship.
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