- 专利标题: Bump formation method and bump forming apparatus for semiconductor wafer
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申请号: US10415587申请日: 2001-11-16
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公开(公告)号: US07052984B2公开(公告)日: 2006-05-30
- 发明人: Shoriki Narita , Masahiko Ikeya , Yasutaka Tsuboi , Takaharu Mae , Shinji Kanayama
- 申请人: Shoriki Narita , Masahiko Ikeya , Yasutaka Tsuboi , Takaharu Mae , Shinji Kanayama
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2000-354448 20001121
- 国际申请: PCT/JP01/10000 WO 20011116
- 国际公布: WO02/43137 WO 20020530
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A bump formation method and a bump forming apparatus for a semiconductor wafer are provided in which productivity when bumps are formed onto the semiconductor wafer is improved as compared with the conventional art. There are provided a bump forming head, a recognition device, and a control device. ICs formed on the semiconductor wafer are divided into basic blocks. Bump formation is performed continuously for the ICs included in one basic block. Positional recognition for the other basic blocks is performed only when the bump formation operation is shifted from one basic block to another basic block. Thus, in comparison with the conventional art whereby a positional recognition operation is performed every time bumps are formed on each IC, the number of times of performing positional recognition is greatly reduced, so that productivity can be improved.
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