发明授权
US07057859B2 Magneto-resistive device with reduced susceptibility to ion beam damage
失效
具有降低的离子束损伤敏感性的磁阻器件
- 专利标题: Magneto-resistive device with reduced susceptibility to ion beam damage
- 专利标题(中): 具有降低的离子束损伤敏感性的磁阻器件
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申请号: US10600444申请日: 2003-06-23
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公开(公告)号: US07057859B2公开(公告)日: 2006-06-06
- 发明人: Takeo Kagami , Kazuki Sato , Takayasu Kanaya , Shunji Saruki , Tetsuya Kuwashima
- 申请人: Takeo Kagami , Kazuki Sato , Takayasu Kanaya , Shunji Saruki , Tetsuya Kuwashima
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2002-188795 20020627
- 主分类号: G11B5/39
- IPC分类号: G11B5/39
摘要:
A magneto-resistive device is improved in characteristics by removing a surface oxide film to reduce the resistance and reducing an ion beam damage. The magneto-resistive device has a magneto-resistive layer which comprises a tunnel barrier layer, an underlying pinned layer, and an overlying free layer. A non-magnetic layer is formed on the free layer for protection. A composite-layer film comprised of an insulating layer and a damage reducing layer is formed in contact with an effective region which is effectively involved in detection of magnetism in the magneto-resistive layer without overlapping with the effective region. The damage reducing layer is made of a material which includes at least one element, the atomic weight of which is larger than that of silicon. The insulating layer and damage reducing layer do not constitute a magnetic domain control layer for applying a biasing magnetic field to the free layer.
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