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发明授权
US07061517B2 Exposure head 失效
曝光头

Exposure head
摘要：
In the present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1(NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter
摘要（中）：

在本发明中，为了获得可接受的增加光束直径的α的范围内的所需焦点深度t，曝光头被设计成使得输出光束宽度D的比D / W与光束宽度 放置DMD的位置的W满足以下关系式。 D W 2 - /> > 在上述公式中，参数定义如下。 λ：激光的波长θ：根据以下公式由光纤的数值孔径（NA）导出的照明光源输出的光束的角度<？in-line-formula description =“In-line 公式“end =”lead“？> theta = sin （NA）<？in-line-formula description =”In-line Formulas“end =”tail“？> D： 从照明光源W输出的光束：DMD放置位置处的光束宽度（照射面）a：DMD上的一个像素的大小K：由光束特性确定的系数，K = 1M ：成像光学系统的放大倍数t：所需的焦深α：可接受的增加光束直径的数量

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