- 专利标题: Semiconductor device and a method of manufacturing the same
-
申请号: US10902141申请日: 2004-07-30
-
公开(公告)号: US07064380B2公开(公告)日: 2006-06-20
- 发明人: Tatsuya Fukumura , Yoshihiro Ikeda , Shunichi Narumi , Izumi Takesue
- 申请人: Tatsuya Fukumura , Yoshihiro Ikeda , Shunichi Narumi , Izumi Takesue
- 申请人地址: JP Tokyo
- 专利权人: Renesas Technology Corp.
- 当前专利权人: Renesas Technology Corp.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout and Kraus, LLP.
- 优先权: JP2003-314648 20030905
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
A semiconductor device having a nonvolatile memory is reduced in size. In an AND type flash memory having a plurality of nonvolatile memory cells having a plurality of first electrodes, a plurality of word lines crossing therewith, and a plurality of floating gate electrodes disposed at positions which respectively lie between the plurality of adjacent first electrodes and overlap the plurality of word lines, as seen in plan view, the plurality of floating gate electrodes are formed in a convex shape, as seen in cross section, so as to be higher than the first electrodes. As a result, even when nonvolatile memory cells are reduced in size, it is possible to process the floating gate electrodes with ease. In addition, it is possible to improve the coupling ratio between floating gate electrodes and control gate electrodes of the word lines without increasing the area occupied by the nonvolatile memory cells.
公开/授权文献
信息查询
IPC分类: