发明授权
- 专利标题： Surface acoustic wave device, filter device and method of producing the surface acoustic wave device
- 专利标题（中）： 声表面波装置，滤波装置及声表面波装置的制造方法
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申请号： US10653213申请日： 2003-09-03
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公开(公告)号： US07067956B2公开(公告)日： 2006-06-27
- 发明人: Masahiko Imai , Michio Miura , Takashi Matsuda , Masanori Ueda , Osamu Ikata
- 申请人： Masahiko Imai , Michio Miura , Takashi Matsuda , Masanori Ueda , Osamu Ikata
- 申请人地址： JP Yokohama JP Kawasaki
- 专利权人： Fujitsu Media Devices Limited,Fujitsu Limited
- 当前专利权人： Fujitsu Media Devices Limited,Fujitsu Limited
- 当前专利权人地址： JP Yokohama JP Kawasaki
- 代理机构： Arent Fox PLLC
- 优先权： JP2002-258642 20020904
- 主分类号： H03H9/25
- IPC分类号： H03H9/25
摘要：
A surface acoustic wave device includes a piezoelectric substrate on which resonators having comb-like electrodes are formed; and a silicon substrate that is directly bonded to the piezoelectric substrate and is less expansive than the piezoelectric substrate, a cavity being formed in the silicon substrate and being located below at least one of the resonators.
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