Process for producing an image using a first minimum bottom antireflective coating composition

Invention Grant

US07070914B2 Process for producing an image using a first minimum bottom antireflective coating composition 有权

Title translation: 使用第一最小底部抗反射涂料组合物制造图像的方法

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Patent Title: Process for producing an image using a first minimum bottom antireflective coating composition
Patent Title (中): 使用第一最小底部抗反射涂料组合物制造图像的方法
Application No.: US10042878

Application Date: 2002-01-09
Publication No.: US07070914B2

Publication Date: 2006-07-04
Inventor: Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
Applicant: Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
Applicant Address: US NJ Somerville
Assignee: AZ Electronic Materials USA Corp.
Current Assignee: AZ Electronic Materials USA Corp.
Current Assignee Address: US NJ Somerville
Agent Sangya Jain
Main IPC: G03F7/00
IPC: G03F7/00

Process for producing an image using a first minimum bottom antireflective coating composition

Abstract:

Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 ⁢ n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.

Abstract(Chinese):

公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARC）组合物，并且涂覆的基材的最大涂层厚度为 $λ2n其中λ是步骤（c）的光化辐射的波长，n是BARC的折射率组成。Public/Granted literature US20030129547A1
Process for producing an image using a first minimum bottom antireflective coating composition Public/Granted day:2003-07-10Information query EspacenetIPC分类: G 物理 G03 摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术 G03F 图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G） G03F7/00 图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）Find Agent Technical Fields Latest Chinese Patents Latest US Patents Semantic Search newFriend Links 专利交易门类知识网企业财务服务中科微点API Changelog WeChat Group © 2025 Shanghai Xiaoyi Network Technology Co., Ltd. .
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