发明授权
US07079721B2 Method and apparatus of monitoring and controlling the emission wavelengths of a plurality of laser sources integrated on the same chip or in the same photonic integrated circuit (PIC)
有权
监测和控制集成在同一芯片上或同一光子集成电路(PIC)中的多个激光源的发射波长的方法和装置,
- 专利标题: Method and apparatus of monitoring and controlling the emission wavelengths of a plurality of laser sources integrated on the same chip or in the same photonic integrated circuit (PIC)
- 专利标题(中): 监测和控制集成在同一芯片上或同一光子集成电路(PIC)中的多个激光源的发射波长的方法和装置,
-
申请号: US10919161申请日: 2004-08-16
-
公开(公告)号: US07079721B2公开(公告)日: 2006-07-18
- 发明人: Fred A. Kish, Jr. , Charles H. Joyner , David F. Welch , Robert B. Taylor , Alan C. Nilsson
- 申请人: Fred A. Kish, Jr. , Charles H. Joyner , David F. Welch , Robert B. Taylor , Alan C. Nilsson
- 申请人地址: US CA Sunnyvale
- 专利权人: Infinera Corporation
- 当前专利权人: Infinera Corporation
- 当前专利权人地址: US CA Sunnyvale
- 代理商 W. Douglas Carothers, Jr.
- 主分类号: G02B6/12
- IPC分类号: G02B6/12
摘要:
A method and apparatus operates an array of laser sources as an integrated array on a single substrate or as integrated in an optical transmitter photonic integrated circuit (TxPIC) maintaining the emission wavelengths of such integrated laser sources at their targeted emission wavelengths or at least to more approximate their desired respective emission wavelengths. Wavelength changing elements may accompany the laser sources to bring about the change in their operational or emission wavelength to be corrected to or toward the desired or target emission wavelength. The wavelength changing elements may be comprise of temperature changing elements, current and voltage changing elements or bandgap changing elements. Identification tags in the form of low frequency tones may be applied relative to respective laser source outputs with a different frequency assigned to each laser source so that each laser can be specifically identified in a feedback control for providing correction signals to the wavelength changing elements to correct for the emission wavelength of respective laser sources.
公开/授权文献
信息查询