发明授权
- 专利标题： Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
- 专利标题（中）： 光刻投影装置，其中使用的反射器组件和装置制造方法
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申请号： US11034260申请日： 2005-01-13
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公开(公告)号： US07088424B2公开(公告)日： 2006-08-08
- 发明人: Levinus Pieter Bakker , Jeroen Jonkers , Frank Jeroen Pieter Schuurmans , Hugo Matthieu Visser
- 申请人： Levinus Pieter Bakker , Jeroen Jonkers , Frank Jeroen Pieter Schuurmans , Hugo Matthieu Visser
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： EP02078390 20020815
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.
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