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    Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
    1.
    发明授权
    Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
    光刻投影装置，其中使用的反射器组件和装置制造方法

    公开(公告)号：US07088424B2

    公开(公告)日：2006-08-08

    申请号：US11034260

    申请日：2005-01-13

    申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

    发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

    IPC分类号： G03B27/42

    CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

    摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

    摘要翻译： 光刻投影设备包括被配置成由辐射源发射的辐射形成辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被辐射束照射时，辐射束具有 模式。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

    Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
    2.
    发明授权
    Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
    光刻投影装置，其中使用的反射器组件和装置制造方法

    公开(公告)号：US07852460B2

    公开(公告)日：2010-12-14

    申请号：US11482147

    申请日：2006-07-07

    申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

    发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

    IPC分类号： G03B27/54

    CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

    摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

    摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

    Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation
    3.
    发明申请
    Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation 有权
    用于在短波辐射产生期间通过辐射源产生的颗粒去除颗粒的方法和装置

    公开(公告)号：US20090206279A1

    公开(公告)日：2009-08-20

    申请号：US10599345

    申请日：2005-03-18

    申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

    发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

    摘要： A method for removing contaminant particles (14), such as atoms, molecules, clusters, ions, and the like, produced by means of a radiation source (10) during generation of short-wave radiation (12) having a wavelength of up to approximately 20 nm, by means of a first gas (22) guided at high mass throughput between the radiation source (10) and a particle trap (20) arranged in a wall (16) of a mirror chamber (18) is described that can be used for a lithography device or a microscope. In order to protect an optical device and/or articles to he irradiated against contamination, the method is designed such that a second gas (24) is introduced into the mirror chamber (18) and its pressure is adjusted such that it is at least as high as the pressure of the first gas (22).

    摘要翻译： 一种用于去除在产生短波辐射（12）期间通过辐射源（10）产生的污染物颗粒（14）的方法，例如原子，分子，簇，离子等，其具有波长直至 描述了通过在辐射源（10）和布置在反射镜腔（18）的壁（16）中的颗粒捕获器（20）之间以高质量通量引导的第一气体（22）的大约20nm，其可以 用于光刻设备或显微镜。 为了保护光学装置和/或物品以照射到污染物上，该方法被设计成使得第二气体（24）被引入反射镜室（18）中，并且调节其压力使其至少等于 作为第一气体（22）的压力高。

    Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
    5.
    发明授权
    Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation 有权
    用于在产生短波辐射期间除去由辐射源产生的颗粒的方法和装置

    公开(公告)号：US08173975B2

    公开(公告)日：2012-05-08

    申请号：US10599345

    申请日：2005-03-18

    申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

    发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

    IPC分类号： G21K5/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

    摘要： A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.

    摘要翻译： 在产生具有高达约20nm的波长的短波辐射的产生期间，用于去除由辐射源产生的污染物颗粒（例如原子，分子，簇，离子等）的方法包括：引导第一气体 辐射源和布置在室的壁中的颗粒捕获器。 为了保护光学装置和/或要照射污染的物品，将第二气体引入室内的方法及其压力被调节至至少与第一气体的压力一样高。

    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07170586B2

    公开(公告)日：2007-01-30

    申请号：US11335681

    申请日：2006-01-20

    申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

    发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

    IPC分类号： G03B24/54

    CPC分类号： G03F7/70008 ,  G03F7/7005

    摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

    摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07030963B2

    公开(公告)日：2006-04-18

    申请号：US10836613

    申请日：2004-05-03

    申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

    发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70008 ,  G03F7/7005

    摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

    摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。