发明授权
- 专利标题: Programming and erasing structure for a floating gate memory cell and method of making
- 专利标题(中): 浮动存储单元的编程和擦除结构及其制作方法
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申请号: US10944239申请日: 2004-09-17
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公开(公告)号: US07094645B2公开(公告)日: 2006-08-22
- 发明人: Craig T. Swift , Gowrishankar L. Chindalore
- 申请人: Craig T. Swift , Gowrishankar L. Chindalore
- 申请人地址: US TX Austin
- 专利权人: Freescale Semiconductor, Inc.
- 当前专利权人: Freescale Semiconductor, Inc.
- 当前专利权人地址: US TX Austin
- 代理商 James L. Clingan, Jr.; Joanna G. Chiu
- 主分类号: H01L21/8247
- IPC分类号: H01L21/8247
摘要:
A floating gate memory cell has a floating gate in which there are two adjacent floating gate layers. The top layer is made to have a contour while leaving the lower layer substantially unchanged. An interlevel dielectric and a control gate follow the contour of the floating gate to increase capacitance between the control gate and the floating gate. The two layers of the floating gate can be polysilicon in which the top layer has the contour formed therein by use of a sacrificial layer. The sacrificial layer is formed over the bottom polysilicon layer and etched. The top polysilicon layer is formed over the sacrificial layer. Subsequent processing of the top polysilicon layer exposes the remaining portion of the sacrificial layer so it can be removed; leaving the contour in the top polysilicon layer for the interlevel dielectric and the control gate.
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