发明授权
- 专利标题: Manufacturing method for wiring circuit substrate
- 专利标题(中): 布线电路基板的制造方法
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申请号: US10823611申请日: 2004-04-14
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公开(公告)号: US07096578B2公开(公告)日: 2006-08-29
- 发明人: Tomoo Iijima , Masayuki Ohsawa
- 申请人: Tomoo Iijima , Masayuki Ohsawa
- 申请人地址: US CA San Jose
- 专利权人: Tessera Interconnect Materials, Inc.
- 当前专利权人: Tessera Interconnect Materials, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- 优先权: JP11-289277 19991012; JP11-374462 19991228; JP2000-142658 20000516
- 主分类号: H05K3/36
- IPC分类号: H05K3/36
摘要:
A method is provided for manufacturing a multi-layer wiring circuit substrate. A first metal layer is selectively etched in first areas to reduce a thickness of the metal layer in the first areas and to form protrusions in other areas which extend above the etched areas. An interlayer-insulating layer is formed to overlie the etched areas of the first metal layer. The interlayer-insulating layer has an inner surface which confronts the etched first areas and an outer surface remote from the inner surface, such that the protrusions extend through the interlayer-insulating layer and have ends exposed at the outer surface. A second metal layer is then provided in conductive communication with the exposed ends of the protrusions, and the first and second metal layers are selectively patterned from surfaces remote from the interlayer-insulating layer.
公开/授权文献
- US20040197962A1 Manufacturing method for wiring circuit substrate 公开/授权日:2004-10-07
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