Invention Grant
- Patent Title: Gallium nitride crystal and method of making same
- Patent Title (中): 氮化镓晶体及其制造方法
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Application No.: US10329981Application Date: 2002-12-27
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Publication No.: US07098487B2Publication Date: 2006-08-29
- Inventor: Mark Philip D'Evelyn , Dong-Sil Park , Steven LeBoeuf , Larry Rowland , Kristi Narang , Huicong Hong , Peter M. Sandvik
- Applicant: Mark Philip D'Evelyn , Dong-Sil Park , Steven LeBoeuf , Larry Rowland , Kristi Narang , Huicong Hong , Peter M. Sandvik
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Shawn A. McClintic; William E. Powell, III
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
There is provided a GaN single crystal at least about 2 millimeters in diameter, with a dislocation density less than about 104 cm−1, and having no tilt boundaries. A method of forming a GaN single crystal is also disclosed. The method includes providing a nucleation center, a GaN source material, and a GaN solvent in a chamber. The chamber is pressurized. First and second temperature distributions are generated in the chamber such that the solvent is supersaturated in the nucleation region of the chamber. The first and second temperature distributions have different temperature gradients within the chamber.
Public/Granted literature
- US20040124434A1 Gallium nitride crystal and method of making same Public/Granted day:2004-07-01
Information query
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