- 专利标题： Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
-
申请号： US10996020申请日： 2004-11-22
-
公开(公告)号： US07105844B2公开(公告)日： 2006-09-12
- 发明人: Benyamin Buller
- 申请人： Benyamin Buller
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan LLP
- 主分类号： H01J37/08
- IPC分类号： H01J37/08 ; G21K5/10
摘要：
A method and system for generating flashes on a substrate. The method includes receiving one or more figures of a pattern to be printed on the substrate and decomposing each figure into at least four substantially rectangular shapes. The four substantially rectangular shapes are separated by at least one horizontal boundary and at least one vertical boundary. The method further includes generating a flash for each substantially rectangular shape such that each edge of each figure is an image of the same aperture.
公开/授权文献
信息查询
