- 专利标题： Composition for vapor deposition, method for forming an antireflection film, and optical element
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申请号： US09986907申请日： 2001-11-13
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公开(公告)号： US07106515B2公开(公告)日： 2006-09-12
- 发明人: Takeshi Mitsuishi , Hitoshi Kamura , Kenichi Shinde , Hiroki Takei , Akinori Kobayashi , Yukihiro Takahashi , Yuko Watanabe
- 申请人： Takeshi Mitsuishi , Hitoshi Kamura , Kenichi Shinde , Hiroki Takei , Akinori Kobayashi , Yukihiro Takahashi , Yuko Watanabe
- 申请人地址： JP Tokyo
- 专利权人： Hoya Corporation
- 当前专利权人： Hoya Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权： JP2000-344928 20001113; JP2001-128157 20010425
- 主分类号： G01B1/10
- IPC分类号： G01B1/10
摘要：
A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.