发明授权
US07115942B2 Method and apparatus for nonvolatile memory 有权
非易失性存储器的方法和装置

  • 专利标题: Method and apparatus for nonvolatile memory
  • 专利标题(中): 非易失性存储器的方法和装置
  • 申请号: US11007907
    申请日: 2004-12-08
  • 公开(公告)号: US07115942B2
    公开(公告)日: 2006-10-03
  • 发明人: Chih-Hsin Wang
  • 申请人: Chih-Hsin Wang
  • 主分类号: H01L29/76
  • IPC分类号: H01L29/76 G11C16/04
Method and apparatus for nonvolatile memory
摘要:
Method and apparatus on charges injection using piezo-ballistic-charges injection mechanism are provided for nonvolatile memory device. The device has a strain source, an injection filter, a tunneling gate, a ballistic gate, a charge storage region, a source, and a drain with a channel defined between the source and drain. The strain source permits piezo-effect in ballistic charges transport to enable the piezo-ballistic-charges injection mechanism. The injection filter permits transporting of charge carriers of one polarity type from the tunneling gate through the blocking material and the ballistic gate to the charge storage region while blocking the transport of charge carriers of an opposite polarity from the ballistic gate to the tunneling gate. The present invention further provides an energy band engineering method permitting the memory device be operated without suffering from disturbs, from dielectric breakdown, from impact ionization, and from undesirable RC effects.
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