Invention Grant
US07115942B2 Method and apparatus for nonvolatile memory 有权
非易失性存储器的方法和装置

  • Patent Title: Method and apparatus for nonvolatile memory
  • Patent Title (中): 非易失性存储器的方法和装置
  • Application No.: US11007907
    Application Date: 2004-12-08
  • Publication No.: US07115942B2
    Publication Date: 2006-10-03
  • Inventor: Chih-Hsin Wang
  • Applicant: Chih-Hsin Wang
  • Main IPC: H01L29/76
  • IPC: H01L29/76 G11C16/04
Method and apparatus for nonvolatile memory
Abstract:
Method and apparatus on charges injection using piezo-ballistic-charges injection mechanism are provided for nonvolatile memory device. The device has a strain source, an injection filter, a tunneling gate, a ballistic gate, a charge storage region, a source, and a drain with a channel defined between the source and drain. The strain source permits piezo-effect in ballistic charges transport to enable the piezo-ballistic-charges injection mechanism. The injection filter permits transporting of charge carriers of one polarity type from the tunneling gate through the blocking material and the ballistic gate to the charge storage region while blocking the transport of charge carriers of an opposite polarity from the ballistic gate to the tunneling gate. The present invention further provides an energy band engineering method permitting the memory device be operated without suffering from disturbs, from dielectric breakdown, from impact ionization, and from undesirable RC effects.
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