Invention Grant
- Patent Title: Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
- Patent Title (中): 在光学传感器系统中使用光学的光刻投影设备，光学布置，测量方法和器件制造方法
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Application No.: US10740823Application Date: 2003-12-22
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Publication No.: US07116401B2Publication Date: 2006-10-03
- Inventor: Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Roeland Nicolaas Maria Vanneer
- Applicant: Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Roeland Nicolaas Maria Vanneer
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pilsbury Winthrop Shaw Pittman, LLP
- Priority: EP99200649 19990308
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.
Public/Granted literature
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