Invention Grant
- Patent Title: Method for fabricating liquid crystal display device
- Patent Title (中): 制造液晶显示装置的方法
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Application No.: US11017853Application Date: 2004-12-22
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Publication No.: US07125756B2Publication Date: 2006-10-24
- Inventor: Jae Young Oh , Kyoung Mook Lee , Sung Jin Hong
- Applicant: Jae Young Oh , Kyoung Mook Lee , Sung Jin Hong
- Applicant Address: KR Seoul
- Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2003-0099327 20031229
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/338

Abstract:
Disclosed is a method for fabricating a thin film transistor for a liquid crystal display device using four masks and without using a diffraction mask. The method of the present invention uses a first mask when forming a gate electrode, a second mask when forming an active pattern, a third mask when forming a plurality of contact holes at an upper portion of a channel layer, and a fourth mask when forming a pixel electrode and source and drain electrodes, so that the resulting liquid crystal display device may be completed by four masks without using a diffraction exposure method. Instead of using a diffraction mask, the present invention uses different etching rates between an insulating layer and an electrode layer, which is used for source and drain electrodes, in fabricating a thin film transistor.
Public/Granted literature
- US20050142704A1 Method for fabricating liquid crystal display device Public/Granted day:2005-06-30
Information query
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