发明授权
US07128279B2 Method and apparatus for fluid delivery to a backside of a substrate 有权
用于流体输送到衬底背面的方法和装置

Method and apparatus for fluid delivery to a backside of a substrate
摘要:
A fluid delivery device for delivering fluid to the backside of a substrate while minimizing waste is provided. The device includes an inner cylindrical tube having a top opening and a bottom opening. An upper cap overlying a top portion of the inner cylindrical tube is included. The upper cap is moveably disposed over the inner cylindrical tube. The upper cap includes a top with at least one hole defined therein. The top includes a sidewall extending therefrom. A system and a method for reducing an amount of a cleaning chemistry applied to a backside of a wafer during a cleaning operation are also provided.
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