发明授权
- 专利标题： Method of forming a piezoelectric layer in forming a piezoelectric element including a lower electrode on one surface of a substrate
- 专利标题（中）： 在基板的一个表面上形成包括下电极的压电元件的形成压电层的方法
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申请号： US10883035申请日： 2004-07-02
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公开(公告)号： US07137179B2公开(公告)日： 2006-11-21
- 发明人: Toshiaki Yokouchi , Koji Sumi
- 申请人： Toshiaki Yokouchi , Koji Sumi
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： JP2003-191247 20030703
- 主分类号： H04R17/00
- IPC分类号： H04R17/00 ; B05D5/12 ; H01L41/04
摘要：
A method of forming a piezoelectric layer includes: a drying step for forming at least one ferroelectric precursor film on a lower electrode of a substrate and drying the ferroelectric precursor film; a degreasing step for carrying the substrate into a region facing a hot plate heated to a certain temperature and for degreasing the ferroelectric precursor film in a state where the substrate is supported by a proximity pin; and a baking step for further baking the degreased ferroelectric precursor film to form the degreased ferroelectric precursor film into a ferroelectric film. The piezoelectric layer is formed by repeating the drying, degreasing, and baking steps for the ferroelectric precursor film in a predetermined number of cycles. The degreasing step includes a step of adjusting a heating temperature of the ferroelectric precursor film by adjusting a distance between the hot plate and the substrate and by lowering a temperature of space on an opposite side of the substrate from the hot plate.
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