发明授权
US07156945B2 Process for forming a patterned thin film structure for in-mold decoration
失效
用于形成用于模内装饰的图案化薄膜结构的方法
- 专利标题： Process for forming a patterned thin film structure for in-mold decoration
- 专利标题（中）： 用于形成用于模内装饰的图案化薄膜结构的方法
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申请号： US10665992申请日： 2003-09-19
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公开(公告)号： US07156945B2公开(公告)日： 2007-01-02
- 发明人: Yi-Shung Chaug , Xiaojia Wang , Sean Kiluk , Scott Tseng , Hongmei Zang , Rong-Chang Liang
- 申请人： Yi-Shung Chaug , Xiaojia Wang , Sean Kiluk , Scott Tseng , Hongmei Zang , Rong-Chang Liang
- 申请人地址： US CA Fremont
- 专利权人： SiPix Imaging, Inc.
- 当前专利权人： SiPix Imaging, Inc.
- 当前专利权人地址： US CA Fremont
- 代理机构： Howrey LLP
- 主分类号： B05D1/32
- IPC分类号： B05D1/32 ; B05D3/10 ; B05D5/12 ; H01L21/31 ; H01L21/36 ; B32B31/10 ; B32B43/00 ; B05C11/11
摘要：
A process for forming a patterned thin film structure on a substrate or in-mold decoration film is disclosed. A pattern is printed with a material, such as a masking coating or ink, on the substrate, the pattern being such that, in one embodiment, the desired structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structure.