Invention Grant
- Patent Title: Man-machine interface for monitoring and controlling a process
- Patent Title (中): 用于监控和控制过程的人机界面
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Application No.: US10493470Application Date: 2002-10-31
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Publication No.: US07158845B2Publication Date: 2007-01-02
- Inventor: Richard Parsons , Deana R. Delp
- Applicant: Richard Parsons , Deana R. Delp
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- International Application: PCT/US02/31608 WO 20021031
- International Announcement: WO03/038729 WO 20030508
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A process monitoring system (100) for monitoring a plasma processing system. The process monitoring system (100) includes a plurality of processing subsystems (120), and a control system (110) coupled to the processing subsystems (120). The control system (110) is configured to receive monitor data from the processing subsystems (120) and send control data to the processing subsystems (120). The process monitoring system (100) also includes an external interface (140) coupled to the control system (110), where the external interface (140) includes a paging system. The process monitoring system further includes a man-machine interface (MMI) coupled to the control system (110). The MMI is configured to display the monitor data, display the control data, and access the paging system.
Public/Granted literature
- US20040236451A1 Man-machine interface for monitoring and controlling a process Public/Granted day:2004-11-25
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