发明授权
- 专利标题: Polishing composition for noble metals
- 专利标题(中): 贵金属抛光组合物
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申请号: US10901420申请日: 2004-07-28
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公开(公告)号: US07161247B2公开(公告)日: 2007-01-09
- 发明人: Francesco De Rege Thesauro , Vlasta Brusic , Christopher C. Thompson , Benjamin P. Bayer
- 申请人: Francesco De Rege Thesauro , Vlasta Brusic , Christopher C. Thompson , Benjamin P. Bayer
- 申请人地址: US IL Aurora
- 专利权人: Cabot Microelectronics Corporation
- 当前专利权人: Cabot Microelectronics Corporation
- 当前专利权人地址: US IL Aurora
- 代理商 Thomas Omholt; Frank Koszyk
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/52 ; H01L29/40
摘要:
The invention provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising a noble metal, the polishing composition comprising (a) an oxidizing agent that oxidizes a noble metal, (b) an anion selected from the group consisting of sulfate, borate, nitrate, and phosphate, and (c) a liquid carrier. The invention further provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising ruthenium, the polishing composition comprising (a) an oxidizing agent that oxidizes ruthenium above the +4 oxidation state, (b) a polishing additive selected from the group consisting of metal sequestering polymers, metal chelators, organic thiols, compounds that reduce ruthenium tetraoxide, lactones, and α-hydroxycarbonyl compounds.
公开/授权文献
- US20060024967A1 Polishing composition for noble metals 公开/授权日:2006-02-02
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