摘要:
The invention provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising a noble metal, the polishing composition comprising (a) an oxidizing agent that oxidizes a noble metal, (b) an anion selected from the group consisting of sulfate, borate, nitrate, and phosphate, and (c) a liquid carrier. The invention further provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising ruthenium, the polishing composition comprising (a) an oxidizing agent that oxidizes ruthenium above the +4 oxidation state, (b) a polishing additive selected from the group consisting of metal sequestering polymers, metal chelators, organic thiols, compounds that reduce ruthenium tetraoxide, lactones, and α-hydroxycarbonyl compounds.
摘要:
The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises an abrasive, an oxidizing agent, an amphiphilic nonionic surfactant, calcium ion or magnesium ion, a corrosion inhibitor for copper, and water, wherein the pH of the polishing composition is about 6 to about 12. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.
摘要:
The invention is directed to a method of polishing a surface of a substrate comprising aluminum, comprising contacting a surface of the substrate with a polishing pad and a polishing composition comprising an abrasive, an agent that oxidizes aluminum, and a liquid carrier, and abrading at least a portion of the surface to remove at least some aluminum from the substrate and to polish the surface of the substrate, wherein the abrasive is in particulate form and is suspended in the liquid carrier.
摘要:
The invention provides a method of chemically-mechanically polishing a substrate. A substrate comprising ruthenium and copper is contacted with a chemical-mechanical polishing system comprising a polishing component, hydrogen peroxide, an organic acid, at least one heterocyclic compound comprising at least one nitrogen atom, and water. The polishing component is moved relative to the substrate, and at least a portion of the substrate is abraded to polish the substrate. The pH of the polishing system is about 6 to about 12, the ruthenium and copper are in electrical contact, and the difference between the open circuit potential of copper and the open circuit potential of ruthenium in the polishing system is about 50 mV or less.
摘要:
The invention relates to systems or kits and methods for repairing defects in gastric bypass operations, e.g., methods of closing intragastric fistulas (18, 20) and dilated gastrojejunal anastomoses. In various embodiments, an endoscopic suturing device (23) is inserted through a patient's mouth, down through the esophagus, and positioned in the region of the defect, e.g., fistula. Adjacent tissue is then acquired, e.g., by vacuum, and one or more stitches are placed through the tissue and tightened to at least partially close the fistula, forming a suture line. One or more reinforcing clips (30) and sealant (32) can be endoscopically applied to the suture line
摘要:
Methods and apparatus for creating an anastomosis or fistula between the gallbladder and an adjacent organ are disclosed. First, a parent magnet, typically a permanent magnet, is deployed in the stomach, small intestine, or another organ adjacent to the gallbladder, and a mating daughter material is deployed in the gallbladder in order to create a magnet-compression anastomosis. The gallbladder may then be ablated or otherwise functionally inactivated through the anastomosis. Another aspect of the invention relates to an all-in-one surgical kit that contains all the necessary specialized tools for a surgeon to perform the procedure.
摘要:
The invention relates to systems or kits and methods for repairing defects in gastric bypass operations, e.g., methods of closing intragastric fistulas (18, 20) and dilated gastrojejunal anastomoses. In various embodiments, an endoscopic suturing device (23) is inserted through a patient's mouth, down through the esophagus, and positioned in the region of the defect, e.g., fistula. Adjacent tissue is then acquired, e.g., by vacuum, and one or more stitches are placed through the tissue and tightened to at least partially close the fistula, forming a suture line. One or more reinforcing clips (30) and sealant (32) can be endoscopically applied to the suture line.
摘要:
A system and method for monitoring a physical parameter of a subject is provided. The system may include a casing with a sensor coupled to the casing. The sensor may be configured to detect a physical parameter of the subject. The physical parameter may include a chemical parameter of the subject. The system includes an endoscopic clip coupled to the casing and may include a wireless transmitter for transmitting a signal via a wireless medium. The signal encodes the physical parameter of the subject detected by the sensor and the wireless transmitter is electronically connected to the endoscopic clip. The system may further include a monitor configured to communicate with the wireless transmitter for receiving the signal encoding the physical parameter of the subject.
摘要:
A system and method for monitoring a physical parameter of a subject is provided. The system may include a casing with a sensor coupled to the casing. The sensor may be configured to detect a physical parameter of the subject. The physical parameter may include a chemical parameter of the subject. The system includes an endoscopic clip coupled to the casing and may include a wireless transmitter for transmitting a signal via a wireless medium. The signal encodes the physical parameter of the subject detected by the sensor and the wireless transmitter is electronically connected to the endoscopic clip. The system may further include a monitor configured to communicate with the wireless transmitter for receiving the signal encoding the physical parameter of the subject.
摘要:
An elongate flexible conduit including a sealing membrane is positioned through a natural body orifice and along the gastrointestinal (GI) tract of a patient. The sealing membrane is advanced along the GI tract until proximate a target wall segment of an inner wall of the GI tract. The sealing membrane is then permanently or releasably attached to the target wall segment thereby sealing off and isolating the target wall segment from the rest of the GI tract establishing a sterile pathway from the target wall to the natural body orifice. An incision is made through both the sealing membrane and the wall of the GI tract to gain access to the peritoneum to perform surgical techniques without allowing bacteria, stomach acids, and other contaminants in the GI tract to enter the peritoneum. An instrument can then be introduced into the peritoneal cavity through the incision along the sterile pathway.