Invention Grant
- Patent Title: Methods and apparatus for configuring plasma cluster tools
- Patent Title (中): 用于配置等离子体集群工具的方法和装置
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Application No.: US11098037Application Date: 2005-03-31
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Publication No.: US07162317B2Publication Date: 2007-01-09
- Inventor: Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
- Applicant: Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: IP Strategy Group, P.C.
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A method for configuring a specific plasma cluster tool having a plurality of modules. The method includes providing a set of module option definition files, the set of module option definition files containing generic configuration definitions for generic plasma cluster tools. The method further includes providing a set of tool-specific protection information, the set of tool-specific protection information including data that specifically identifies the particular plasma cluster tool for which the configuring is intended. The method further includes providing a set of tool-specific options specifications, the set of tool-specific options specifications specifying options that are specified for the specific plasma cluster tool. The method additionally includes generating a key file, the key file encapsulating configuration restrictions imposed on the specific plasma cluster tool, the key file being configured to be a required file in the configuring the specific plasma tool.
Public/Granted literature
- US20060194351A1 Methods and apparatus for configuring plasma cluster tools Public/Granted day:2006-08-31
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