Invention Grant
- Patent Title: Plasma source assembly and method of manufacture
- Patent Title (中): 等离子体源组件及其制造方法
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Application No.: US10601590Application Date: 2003-06-24
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Publication No.: US07163603B2Publication Date: 2007-01-16
- Inventor: Steven T. Fink
- Applicant: Steven T. Fink
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C23C16/00

Abstract:
A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the helical coil. Preferably, the assembly includes a plenum cooling plate that is configured to supply cooling fluid to a first cooling rod provided within a resonator cavity defined by the chamber wall and the outer shield, and receive cooling fluid from a second cooling rod provided within the resonator cavity. The assembly preferably also includes a spacer provided between the first cooling rod and the second cooling rod, and coil insulators having holes configured to receive the helical coil.
Public/Granted literature
- US20040084153A1 Plasma source assembly and method of manufacture Public/Granted day:2004-05-06
Information query
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