Invention Grant
- Patent Title: Cylinder-based plasma processing system
- Patent Title (中): 基于气缸的等离子体处理系统
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Application No.: US10476883Application Date: 2002-05-07
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Publication No.: US07166170B2Publication Date: 2007-01-23
- Inventor: Steven T. Fink
- Applicant: Steven T. Fink
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- International Application: PCT/US02/11875 WO 20020507
- International Announcement: WO02/093605 WO 20021121
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/50 ; H01L21/02 ; H01L21/3065

Abstract:
A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then hermetically sealed to the top and bottom of the cylinder. Fasteners (and the vacuum inside the chamber) clamp the plates to the cylinder.
Public/Granted literature
- US20040149210A1 Cylinder-based plasma processing system Public/Granted day:2004-08-05
Information query
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