Invention Grant
- Patent Title: Photopolymer composition suitable for lithographic printing plates
- Patent Title (中): 适用于平版印刷版的光聚合物组合物
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Application No.: US10536510Application Date: 2003-11-28
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Publication No.: US07169534B2Publication Date: 2007-01-30
- Inventor: Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
- Applicant: Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
- Applicant Address: DE Osterode/Harz
- Assignee: Kodak Polychrome Graphics GmbH
- Current Assignee: Kodak Polychrome Graphics GmbH
- Current Assignee Address: DE Osterode/Harz
- Agent J. Lanny Tucker
- Priority: DE10255664 20021128
- International Application: PCT/EP03/13432 WO 20031128
- International Announcement: WO2004/049069 WO 20040610
- Main IPC: G03F7/027
- IPC: G03F7/027
Abstract:
Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
Public/Granted literature
- US20060078819A1 Photopolymer composition suitable for lithographic printing plates Public/Granted day:2006-04-13
Information query
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