Invention Grant
US07170580B2 Lithographic apparatus, projection system, method of projecting and device manufacturing method
有权
平版印刷设备，投影系统，投影方法和器件制造方法
- Patent Title: Lithographic apparatus, projection system, method of projecting and device manufacturing method
- Patent Title (中): 平版印刷设备，投影系统，投影方法和器件制造方法
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Application No.: US10823772Application Date: 2004-04-14
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Publication No.: US07170580B2Publication Date: 2007-01-30
- Inventor: Martinus Hendrikus Antonius Leenders , Henrikus Herman Marie Cox , Leon Martin Levasier
- Applicant: Martinus Hendrikus Antonius Leenders , Henrikus Herman Marie Cox , Leon Martin Levasier
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP03076107 20030414
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/70
Abstract:
A projection system includes at least one projection device configured to receive a beam of radiation coming from a first object and project the beam to a second object. The projection system further includes a sensor configured to measure a spatial orientation of the at least one projection device and a processing unit configured to communicate with the at least one sensor. The processing unit is configured to communicate with a positioning device configured to adjust the position of at least one of the first object and the second object based on the measured spatial orientation of the at least one projection device.
Public/Granted literature
- US20040257549A1 Lithographic apparatus, projection system, method of projecting and device manufacturing method Public/Granted day:2004-12-23
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