Invention Grant
- Patent Title: SiO2-TiO2 glass body with improved resistance to radiation
- Patent Title (中): 具有改善耐辐射性能的SiO2-TiO2玻璃体
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Application No.: US11087885Application Date: 2005-03-23
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Publication No.: US07172983B2Publication Date: 2007-02-06
- Inventor: Jochen Alkemper , Joerg Schuhmacher , Hrabanus Hack , Oliver Sohr
- Applicant: Jochen Alkemper , Joerg Schuhmacher , Hrabanus Hack , Oliver Sohr
- Applicant Address: DE Mainz
- Assignee: Schott AG
- Current Assignee: Schott AG
- Current Assignee Address: DE Mainz
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: DE102004015766 20040323
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B20/00 ; C03B25/00
Abstract:
The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.
Public/Granted literature
- US20050215413A1 SiO2-TiO2 glass body with improved resistance to radiation Public/Granted day:2005-09-29
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