发明授权
- 专利标题: Method of making a circuitized substrate
- 专利标题(中): 制造电路化基板的方法
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申请号: US10738705申请日: 2003-12-16
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公开(公告)号: US07185428B2公开(公告)日: 2007-03-06
- 发明人: Frank D. Egitto , Kevin T. Knadle , Andrew M. Seman
- 申请人: Frank D. Egitto , Kevin T. Knadle , Andrew M. Seman
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Schmeiser, Olsen & Watts
- 代理商 William H. Steinberg
- 主分类号: H05K3/02
- IPC分类号: H05K3/02
摘要:
A circuitized substrate and a method of making the circuitized substrate is provided. The circuitized substrate includes a substrate having a substantially planar upper surface and a conductive layer positioned on the substantially planar upper surface. The conductive layer includes at least one side wall therein, defining an opening in the conductive layer. The conductive layer includes an end portion spaced from the opening, the end portion forming an acute angle with the substantially planar upper surface of the substrate. The at least one side wall is substantially perpendicular to the substantially planar upper surface of the substrate.
公开/授权文献
- US20040130003A1 Fine line circuitization 公开/授权日:2004-07-08
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