发明授权
- 专利标题: Measuring method and apparatus using attenuation in total internal reflection
- 专利标题(中): 在全内反射中使用衰减的测量方法和装置
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申请号: US10291566申请日: 2002-11-12
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公开(公告)号: US07187444B2公开(公告)日: 2007-03-06
- 发明人: Masayuki Naya , Mitsuru Sawano , Shu Sato , Toshihito Kimura , Hitoshi Shimizu
- 申请人: Masayuki Naya , Mitsuru Sawano , Shu Sato , Toshihito Kimura , Hitoshi Shimizu
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2001-346217 20011112; JP2002-068357 20020313; JP2002-092282 20020328; JP2002-095313 20020329; JP2002-249680 20020828; JP2002-254780 20020830
- 主分类号: G01N21/55
- IPC分类号: G01N21/55
摘要:
In a measuring method utilizing the phenomenon of attenuation in total internal reflection in which a light beam is caused to enter a dielectric block provided with a film layer to be brought into contact with a sample so that total internal reflection conditions are satisfied at the interface of the dielectric block and the film layer and various angles of incidence of the light beam to the interface of the dielectric block and the film layer can be obtained, and the intensity of the light beam reflected in total internal reflection at the interface is detected, the light beam is caused to intermittently impinge upon the dielectric block.
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