发明授权
US07192828B2 Capacitor with high dielectric constant materials and method of making
有权
具有高介电常数材料和制作方法的电容器
- 专利标题: Capacitor with high dielectric constant materials and method of making
- 专利标题(中): 具有高介电常数材料和制作方法的电容器
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申请号: US10819420申请日: 2004-04-07
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公开(公告)号: US07192828B2公开(公告)日: 2007-03-20
- 发明人: Cem Basceri , Gurtej S. Sandhu , Sam Yang
- 申请人: Cem Basceri , Gurtej S. Sandhu , Sam Yang
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Dinsmore & Shohl LLP
- 主分类号: H01L21/8242
- IPC分类号: H01L21/8242
摘要:
A stabilized capacitor using non-oxide electrodes and high dielectric constant oxide dielectric materials and methods of making such capacitors and their incorporation into DRAM cells is provided. A preferred method includes providing a non-oxide electrode, oxidizing an upper surface of the non-oxide electrode, depositing a high dielectric constant oxide dielectric material on the oxidized surface of the non-oxide electrode, and depositing an upper layer electrode on the high dielectric constant oxide dielectric material.
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