发明授权
- 专利标题: ESD protection structure and method utilizing substrate triggering for a high-voltage tolerant pad
- 专利标题(中): ESD保护结构和方法利用高耐压焊盘的基板触发
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申请号: US10854792申请日: 2004-05-27
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公开(公告)号: US07193274B2公开(公告)日: 2007-03-20
- 发明人: Meng-Huang Liu , Chun-Hsiang Lai , Shin Su , Yen-Hung Yeh , Chia-Ling Lu , Tao-Cheng Lu
- 申请人: Meng-Huang Liu , Chun-Hsiang Lai , Shin Su , Yen-Hung Yeh , Chia-Ling Lu , Tao-Cheng Lu
- 申请人地址: TW Hsinchu
- 专利权人: Macronix International Co., Ltd.
- 当前专利权人: Macronix International Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Rabin & Berdo, P.C.
- 优先权: TW92124326A 20030903
- 主分类号: H01L29/72
- IPC分类号: H01L29/72
摘要:
In an ESD protection structure and method utilizing substrate triggering for a high-voltage tolerant pad on a substrate, an ESD protection device has a source connected to the pad and a gate and a drain both connected to a ground, and a substrate-triggering control circuit is used to keep the substrate at a low voltage during a normal operation, and pumping the substrate to a high voltage during an ESD event for the ESD protection device to be triggered much easier. The substrate-triggering control circuit is implemented with an active device, thereby reducing the chip size for the circuit and the loading effect on the pad.
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