发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10946344申请日： 2004-09-22
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公开(公告)号： US07193681B2公开(公告)日： 2007-03-20
- 发明人: Christiaan Alexander Hoogendam , Erik Theodorus Maria Bijlaart , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人： Christiaan Alexander Hoogendam , Erik Theodorus Maria Bijlaart , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03256095 20030929
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42 ; G03B27/58 ; G03B27/32
摘要：
A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
公开/授权文献
- US20050088635A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-04-28
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