发明授权
- 专利标题： Optical lithography fluoride crystal annealing furnace
- 专利标题（中）： 光刻氟化物晶体退火炉
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申请号： US11059980申请日： 2005-02-16
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公开(公告)号： US07198673B2公开(公告)日： 2007-04-03
- 发明人: John H. Brennan , Michael W. Price , Juergen Tinz , Liming Wang
- 申请人： John H. Brennan , Michael W. Price , Juergen Tinz , Liming Wang
- 申请人地址： US NY Corning
- 专利权人： Corning Incorporated
- 当前专利权人： Corning Incorporated
- 当前专利权人地址： US NY Corning
- 代理商 Walter M. Douglas
- 主分类号： C30B11/00
- IPC分类号： C30B11/00
摘要：
A method of making below 250-nm UV light transmitting optical fluoride lithography crystals includes applying heat along a shortest path of conduction of a selected optical fluoride crystal, heating the optical fluoride crystal to an annealing temperature, holding the temperature of the optical fluoride crystal at the annealing temperature, and gradually cooling the optical fluoride crystal to provide a low-birefringence optical fluoride crystal for transmitting below 250-nm UV light.
公开/授权文献
- US20050139152A1 Optical lithography fluoride crystal annealing furnace 公开/授权日：2005-06-30
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