发明授权
- 专利标题: Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
- 专利标题(中): 校正系统,偏转失真校正方法,制造半导体器件的程序和方法
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申请号: US10948555申请日: 2004-09-24
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公开(公告)号: US07202488B2公开(公告)日: 2007-04-10
- 发明人: Takumi Ota , Tetsuro Nakasugi
- 申请人: Takumi Ota , Tetsuro Nakasugi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JPP2003-342369 20030930
- 主分类号: H01J37/302
- IPC分类号: H01J37/302 ; H01J37/30 ; G03C5/00
摘要:
A method of correcting deflection distortion includes dividing a deflection area to which a charged-particle beam is deflected into equal initial blocks as an initial setting, calculating an initial aberration amount for each of the initial blocks generated when the charged-particle beam is deflected, dividing the deflection area into main blocks in accordance with a change rate of the initial aberration amount; calculating a main aberration amount for each of the main blocks generated when the charged-particle beam is deflected, and calculating a correction value correcting a deflection distortion based on the main aberration amount.
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