发明授权
US07202488B2 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device 失效
校正系统,偏转失真校正方法,制造半导体器件的程序和方法

Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
摘要:
A method of correcting deflection distortion includes dividing a deflection area to which a charged-particle beam is deflected into equal initial blocks as an initial setting, calculating an initial aberration amount for each of the initial blocks generated when the charged-particle beam is deflected, dividing the deflection area into main blocks in accordance with a change rate of the initial aberration amount; calculating a main aberration amount for each of the main blocks generated when the charged-particle beam is deflected, and calculating a correction value correcting a deflection distortion based on the main aberration amount.
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