公开(公告)号：US08906281B2

公开(公告)日：2014-12-09

申请号：US13402244

申请日：2012-02-22

申请人： Masayuki Hatano ,  Takumi Ota ,  Yohko Furutono

发明人： Masayuki Hatano ,  Takumi Ota ,  Yohko Furutono

IPC分类号： B29C59/02 ,  G03F7/00

CPC分类号： G03F7/002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

摘要翻译： 在根据一个实施例的压印方法中，在该状态下，在抗蚀剂固化的同时，将其上形成有模板图案的模板压在要转印的基板上的抗蚀剂上。 随后将模板与固化的抗蚀剂分离。 然后在模板与固化的抗蚀剂分离之后，直到模板在下一次照射下被抵抗抗蚀剂时，模板从模板图案表面侧脱气。

公开(公告)号：US08368018B2

公开(公告)日：2013-02-05

申请号：US12506475

申请日：2009-07-21

申请人： Masahiro Hatakeyama ,  Takumi Ota

发明人： Masahiro Hatakeyama ,  Takumi Ota

IPC分类号： G01N23/00

CPC分类号： H01J37/26 ,  G03F1/86 ,  H01J2237/0047 ,  H01J2237/2817 ,  H01L21/67213 ,  H01L22/12

摘要： A charged particle beam inspection apparatus comprises: an electron gun for irradiating an electron beam onto a sample; a detector for detecting a signal obtained from the sample; an image processor for forming an image from the signal obtained from the detector, and an energy controller for controlling the beam energy of the electron beam to be irradiated onto the sample. An identical charged particle beam inspection apparatus carries out a plurality of types of inspections. An inspection apparatus of a projection type may be applied thereto. A pattern defect inspection, a foreign material inspection, and an inspection for a defect in a multilayer are carried out. Beam energies E1, E2, and E3 in those inspections have a relation E1>E2 and E3>E2. Charge removal is performed in a transport chamber or other vacuum chamber before an inspection.

摘要翻译： 带电粒子束检查装置包括：用于将电子束照射到样品上的电子枪; 用于检测从样品获得的信号的检测器; 用于根据从检测器获得的信号形成图像的图像处理器，以及用于控制待照射到样品上的电子束的束能量的能量控制器。 相同的带电粒子束检查装置执行多种类型的检查。 可以对投影型的检查装置施加。 进行图案缺陷检查，异物检查和多层的缺陷检查。 这些检查中的能量E1，E2和E3具有E1> E2和E3> E2的关系。 在检查之前，在运输室或其他真空室中进行除电。

公开(公告)号：US20120244719A1

公开(公告)日：2012-09-27

申请号：US13402244

申请日：2012-02-22

申请人： Masayuki HATANO ,  Takumi OTA ,  Yohko FURUTONO

发明人： Masayuki HATANO ,  Takumi OTA ,  Yohko FURUTONO

IPC分类号： H01L21/304 ,  B29C59/02 ,  B29C47/76

CPC分类号： G03F7/002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

摘要翻译： 在根据一个实施例的压印方法中，在该状态下，在抗蚀剂固化的同时，将其上形成有模板图案的模板压在要转印的基板上的抗蚀剂上。 随后将模板与固化的抗蚀剂分离。 然后在模板与固化的抗蚀剂分离之后，直到模板在下一次照射下被抵抗抗蚀剂时，模板从模板图案表面侧脱气。

公开(公告)号：US20120222700A1

公开(公告)日：2012-09-06

申请号：US13410544

申请日：2012-03-02

申请人： Takumi OTA

发明人： Takumi OTA

IPC分类号： B08B7/00 ,  B29C59/02

CPC分类号： G03F7/0002 ,  B08B7/0035 ,  B82Y10/00 ,  B82Y40/00

摘要： According to one embodiment, a template substrate processing apparatus used in imprint lithography, includes a stage which has a convex portion that engages with a concave portion formed at an underside of the template substrate.

摘要翻译： 根据一个实施例，在压印光刻中使用的模板基板处理装置包括具有与形成在模板基板的下侧的凹部接合的凸部的台。

公开(公告)号：US20120129279A1

公开(公告)日：2012-05-24

申请号：US13230197

申请日：2011-09-12

申请人： Yasuo MATSUOKA ,  Takumi OTA ,  Ryoichi INANAMI

发明人： Yasuo MATSUOKA ,  Takumi OTA ,  Ryoichi INANAMI

IPC分类号： H01L21/66 ,  B05C9/14 ,  B05C9/12 ,  B05C11/02 ,  B05C11/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： According to one embodiment, there is provided an imprinting method for applying a first hardening resin material on a substrate to be processed and transferring a pattern of a semiconductor integrated circuit formed on a template onto the substrate to be processed on which the first hardening resin material is applied, wherein a second hardening resin material with higher separability than the first hardening resin material is applied on at least part of the outer periphery of an area in which the pattern is formed by one transferring.

摘要翻译： 根据一个实施例，提供一种压印方法，用于将第一硬化树脂材料施加到待加工的基板上，并将形成在模板上的半导体集成电路的图案转印到待加工的基板上，在该基板上第一硬化树脂材料 其中通过一次转印在其形成图案的区域的外周的至少一部分上施加具有比第一硬化树脂材料更高的分离性的第二硬化树脂材料。

公开(公告)号：US08142694B2

公开(公告)日：2012-03-27

申请号：US12722937

申请日：2010-03-12

申请人： Hiroshi Tokue ,  Takumi Ota

发明人： Hiroshi Tokue ,  Takumi Ota

IPC分类号： B29C45/76

CPC分类号： B29C59/022 ,  B29C35/0888 ,  B29C37/0003 ,  B29C37/0096 ,  B29C2035/0827 ,  B29C2037/90 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A method for forming an imprint pattern includes: contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material; releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate; measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming; and comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not.

摘要翻译： 形成压印图案的方法包括：使具有第一图案的模板与待处理基板上的可固化材料接触并固化可固化材料; 在固化后从可固化材料释放模板以形成由可固化材料制成的第二图案，使得第一图案被转印并形成为基板的第二图案; 测量模板在转移和成型后与可固化材料分离时需要分离模板的载荷或时间中的至少一个; 以及将所测量的负载或时间与预定阈值进行比较，并确定所测量的负载或时间是否超过预定阈值。

公开(公告)号：US20110143271A1

公开(公告)日：2011-06-16

申请号：US12822716

申请日：2010-06-24

申请人： Takeshi KOSHIBA ,  Hidefumi Mukai ,  Kazuhito Kobayashi ,  Takumi Ota

发明人： Takeshi KOSHIBA ,  Hidefumi Mukai ,  Kazuhito Kobayashi ,  Takumi Ota

IPC分类号： G03F7/20

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A pattern generating method includes obtaining an on-substrate pattern by performing a process for forming the on-substrate pattern by simulation or experiment based on a design pattern of the on-substrate pattern formed by an imprint process using a template, employing the design pattern when a comparison result of the design pattern and obtained on-substrate pattern satisfies a predetermined condition, and correcting the design pattern to satisfy the predetermined condition when the comparison result does not satisfy the predetermined condition.

摘要翻译： 图案生成方法包括通过基于通过使用模板的压印处理形成的衬底上图案的设计图案通过模拟或实验进行用于形成衬底上图案的处理来获得衬底图案，采用设计图案 当设计图案和获得的基板图案的比较结果满足预定条件时，并且当比较结果不满足预定条件时，校正设计图案以满足预定条件。

公开(公告)号：US20100022036A1

公开(公告)日：2010-01-28

申请号：US12179804

申请日：2008-07-25

申请人： Ikuo YONEDA ,  Takumi Ota ,  Takeshi Koshiba

发明人： Ikuo YONEDA ,  Takumi Ota ,  Takeshi Koshiba

IPC分类号： H01L21/66

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： According to an aspect of the present invention, there is provided a template including: a template substrate; patterns for forming device patterns on a wafer substrate; and a charging monitoring pattern, a size of the charging monitoring pattern being equal to a largest pattern in the patterns for forming the device patterns.

摘要翻译： 根据本发明的一个方面，提供了一种模板，包括：模板基板; 用于在晶片衬底上形成器件图案的图案; 以及充电监视模式，充电监视模式的大小等于用于形成设备模式的模式中的最大模式。

公开(公告)号：US20060289805A1

公开(公告)日：2006-12-28

申请号：US11430044

申请日：2006-05-09

申请人： Tetsuro Nakasugi ,  Noriaki Sasaki ,  Takeshi Koshiba ,  Takumi Ota

发明人： Tetsuro Nakasugi ,  Noriaki Sasaki ,  Takeshi Koshiba ,  Takumi Ota

IPC分类号： G21G5/00

CPC分类号： H01J37/3026 ,  H01J2237/31761

摘要： According to an aspect of the invention, there is provided an electron beam lithography apparatus including a first setting unit configured to set a drawing position on a semiconductor substrate based on layout information of the semiconductor substrate, a second setting unit configured to set a valid range on the semiconductor substrate based on shape information of the semiconductor substrate, a determination unit configured to determine whether or not the drawing position falls within the valid range, and an irradiation unit configured to irradiate the semiconductor substrate with an electron beam when the determination unit determines that the drawing position falls within the valid range.

公开(公告)号：US6009053A

公开(公告)日：1999-12-28

申请号：US162988

申请日：1998-09-29

申请人： Takumi Ota ,  Akihiro Kishishita ,  Kiyoshi Kodani ,  Masayuki Hayashida

发明人： Takumi Ota ,  Akihiro Kishishita ,  Kiyoshi Kodani ,  Masayuki Hayashida

IPC分类号： G11B7/0037 ,  G11B7/005 ,  G11B19/04 ,  G11B19/28 ,  G11B33/08 ,  G11B7/00 ,  G11B5/09

CPC分类号： G11B19/04 ,  G11B19/28 ,  G11B33/08 ,  G11B7/0037 ,  G11B7/005

摘要： In an optical disk reproducing device capable of rotating an optical disk at a selected one of a plurality of preset linear velocities, vibration or shock of the device is detected during rotation of the disk, and the linear velocity of the disk is determined based on the result of the detection of the vibration or shock to restrain the vibration and shock within a permissible range. A limit rotational velocity above which the vibration or shock is excessive may be determined during a test conducted each time a disk is inserted, and the linear velocity of the disk during reproduction may be determined such that the rotational velocity does not exceed the limit rotational velocity.