发明授权
US07211844B2 Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage
有权
掺杂半导体纳米管的垂直场效应晶体管在间隔物界定的通道中生长
- 专利标题: Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage
- 专利标题(中): 掺杂半导体纳米管的垂直场效应晶体管在间隔物界定的通道中生长
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申请号: US10767039申请日: 2004-01-29
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公开(公告)号: US07211844B2公开(公告)日: 2007-05-01
- 发明人: Toshiharu Furukawa , Mark Charles Hakey , Steven John Holmes , David Vaclav Horak , Peter H. Mitchell , Larry Alan Nesbit
- 申请人: Toshiharu Furukawa , Mark Charles Hakey , Steven John Holmes , David Vaclav Horak , Peter H. Mitchell , Larry Alan Nesbit
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Wood, Herron & Evans, LLP
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
Vertical field effect transistors having a channel region defined by at least one semiconducting nanotube and methods for fabricating such vertical field effect transistors by chemical vapor deposition using a spacer-defined channel. Each nanotube is grown by chemical vapor deposition catalyzed by a catalyst pad positioned at the base of a high-aspect-ratio passage defined between a spacer and a gate electrode. Each nanotube grows in the passage with a vertical orientation constrained by the confining presence of the spacer. A gap may be provided in the base of the spacer remote from the mouth of the passage. Reactants flowing through the gap to the catalyst pad participate in nanotube growth.
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