发明授权
- 专利标题: Insulated gate semiconductor device
- 专利标题(中): 绝缘栅半导体器件
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申请号: US11154743申请日: 2005-06-17
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公开(公告)号: US07211861B2公开(公告)日: 2007-05-01
- 发明人: Satoshi Teramae , Shigeru Hasegawa , Hideaki Ninomiya , Masahiro Tanaka
- 申请人: Satoshi Teramae , Shigeru Hasegawa , Hideaki Ninomiya , Masahiro Tanaka
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2004-181580 20040618
- 主分类号: H01L29/06
- IPC分类号: H01L29/06
摘要:
An insulated gate semiconductor device, includes an isolating structure shaped in a circulating section along the periphery of a semiconductor substrate to isolate that part from an inside device region, a peripheral diffusion region of the semiconductor substrate located outside the isolating structure, a plurality of cell structures defined in the inside device region and divided in segments by insulated trench-shaped gates to have a base region covered with an emitter region in its upper surface, a collector region, and an emitter electrode electrically connected to the emitter region and the base region, a dummy base region contiguous to the cell structures and configured as a base region that has its upper surface left without the emitter region connected to the emitter electrode, an inner region defined in and insulated from the dummy base region, and a connection part to electrically connect the inner region to the emitter electrode.
公开/授权文献
- US20050280078A1 Insulated gate semiconductor device 公开/授权日:2005-12-22
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