Invention Grant
- Patent Title: Plasma generation and processing with multiple radiation sources
- Patent Title (中): 具有多种辐射源的等离子体产生和处理
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Application No.: US10430415Application Date: 2003-05-07
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Publication No.: US07227097B2Publication Date: 2007-06-05
- Inventor: Satyendra Kumar , Devendra Kumar
- Applicant: Satyendra Kumar , Devendra Kumar
- Applicant Address: US MA N. Billerica
- Assignee: BTU International, Inc.
- Current Assignee: BTU International, Inc.
- Current Assignee Address: US MA N. Billerica
- Agency: Weingarten, Schurgin, Gagnebin & Lebovici LLP
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
Public/Granted literature
- US20040001295A1 Plasma generation and processing with multiple radiation sources Public/Granted day:2004-01-01
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