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US07227097B2 Plasma generation and processing with multiple radiation sources 失效
具有多种辐射源的等离子体产生和处理

Plasma generation and processing with multiple radiation sources
Abstract:
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
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