发明授权
- 专利标题: Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
- 专利标题(中): 一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法
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申请号: US11149568申请日: 2005-06-10
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公开(公告)号: US07227616B2公开(公告)日: 2007-06-05
- 发明人: Paul Graeupner
- 申请人: Paul Graeupner
- 申请人地址: DE
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE
- 代理机构: Young Basile
- 优先权: DE10257766 20021210
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52
摘要:
A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.