-
1.发明授权Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus 失效一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法公开(公告)号：US08237915B2
公开(公告)日：2012-08-07
申请号：US12203738
申请日：2008-09-03
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。
-
2.发明授权Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus 有权一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法公开(公告)号：US07227616B2
公开(公告)日：2007-06-05
申请号：US11149568
申请日：2005-06-10
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。
-
公开(公告)号：US08917379B2
公开(公告)日：2014-12-23
申请号：US12483733
申请日：2009-06-12
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70091 , G03F7/70066 , G03F7/70083 , G03F7/701 , G03F7/70108 , G03F7/70116 , G03F7/70125 , G03F7/70891
摘要： Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle θ, and a pole area APOLE according to: 0.6
摘要翻译： 公开了投影曝光方法，系统，子系统和组件。 方法可以包括对图案的第一子图案进行第一曝光以对图像进行成像，其中第一子图案包括沿第一方向延伸的多个第一特征，并且在第二方向上以主要周期性长度P基本上周期性地间隔开 垂直于第一方向。 可以使用多极照明模式来执行第一曝光，所述多极照明模式包括至少一个基本上是偶极子强度分布，其具有两个位于基本上平行于第二方向并且彼此间隔开的极取向轴上的照明极。 偶极子强度分布的极点可以各自具有由极角度和方位角定义的方位角宽度;以及根据下式的极点面积APOLE：0.6
-
4.发明授权Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权用于在微光刻曝光设备中照射掩模的照明系统公开(公告)号：US08416390B2
公开(公告)日：2013-04-09
申请号：US12533756
申请日：2009-07-31
CPC分类号： G03F7/70216 , G03F7/70116 , G03F7/70158
摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。
-
公开(公告)号：US07352435B2
公开(公告)日：2008-04-01
申请号：US10964816
申请日：2004-10-15
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译： 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
-
公开(公告)号：US20060164655A1
公开(公告)日：2006-07-27
申请号：US11389053
申请日：2006-03-27
申请人： Wolfgang Emer , Paul Graeupner
发明人： Wolfgang Emer , Paul Graeupner
IPC分类号： G01B9/02
CPC分类号： G01M11/0242 , G01M11/0278 , G02B27/0025 , G03F7/706
摘要： In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.
摘要翻译： 在用于制造光学成像系统的方法中，在传输光学成像系统之前和之后确定由光学成像系统引起的波前像差。 将在先前确定中确定的至少一些像差参数用作用于在后续确定中确定像差参数的给定前提条件。 这导致混合方法，其中以组合的形式使用至少两种测量方法的强度，并且避免了任何一种方法的特定弱点。
-
公开(公告)号：US07019846B2
公开(公告)日：2006-03-28
申请号：US10445076
申请日：2003-05-27
申请人： Wolfgang Emer , Paul Graeupner
发明人： Wolfgang Emer , Paul Graeupner
IPC分类号： G01B9/02
CPC分类号： G01M11/0242 , G01M11/0278 , G02B27/0025 , G03F7/706
摘要： In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.
摘要翻译： 在用于确定用于光学成像系统中的成像特征的表征的波前像差的方法中，来自在连续时间执行的两种不同测量方法的测量结果被组合。 在这种情况下，在先前的第一测量方法中确定的至少一些像差参数被用作借助于第二测量方法来确定像差参数的给定前提条件，并相应地进行评估。 这导致混合方法，其中以组合形式使用至少两种测量方法的强度，并且可以避免任何一种方法的特定弱点。
-
公开(公告)号：US20110211181A1
公开(公告)日：2011-09-01
申请号：US13102620
申请日：2011-05-06
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译： 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
-
9.发明授权公开(公告)号：US07800732B2
公开(公告)日：2010-09-21
申请号：US12643637
申请日：2009-12-21
CPC分类号： G03F7/70333 , G03F9/7026
摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.
摘要翻译： 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。
-
10.发明申请公开(公告)号：US20100157266A1
公开(公告)日：2010-06-24
申请号：US12643637
申请日：2009-12-21
IPC分类号： G03B27/42
CPC分类号： G03F7/70333 , G03F9/7026
摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.
摘要翻译： 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。
-
-
-
-
-
-
-
-
-
搜索结果
35 条记录 (耗时 0.019 秒)
