Invention Grant
- Patent Title: Method and apparatus for monitoring the condition of plasma equipment
- Patent Title (中): 监测等离子体设备状况的方法和装置
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Application No.: US10484723Application Date: 2002-07-24
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Publication No.: US07227624B2Publication Date: 2007-06-05
- Inventor: Steven T. Fink , Thomas Windhorn
- Applicant: Steven T. Fink , Thomas Windhorn
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- International Application: PCT/US02/23477 WO 20020724
- International Announcement: WO03/010517 WO 20030206
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An apparatus (100) senses a degree of cleanliness of a plasma reactor having a chamber (102) containing a plasma (103) that emits light (104) during a process conducted in the chamber (102). The apparatus (100) also has a light sensing element (180), configured to sense an intensity of the light (104) emitted by the plasma (103) after the light (104) passes through a film (135) that accrues in the chamber (102) during the process, and to provide a light intensity indication signal, and an electronics assembly (170) configured to receive the light intensity indication signal and to provide an indication of the degree of cleanliness of the plasma reactor.
Public/Granted literature
- US20040184028A1 Method and apparatus for monitoring the condition of plasma equipment Public/Granted day:2004-09-23
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